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Energy-band engineering and characterization improvements by fluorine incorporation on Gd2O3 nanocrystal memory

机译:通过在Gd2O3纳米晶体存储器中掺入氟来进行能带工程和表征改进

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As a potential candidate for future nonvolatile memory (NVM) application, the discrete charge storage nodes formed as the nanocrystal (NC) structure has been caught much attention. Among the NC materials, high-k metal oxide is the unique one due to the mixed chemical reactions during high temperature forming process. The over-view of gadolinium oxide nanocrystal (Gd
机译:作为未来的非易失性存储器(NVM)应用的潜在候选者,形成为纳米晶体(NC)结构的离散电荷存储节点已引起广泛关注。在NC材料中,高k金属氧化物是唯一的一种,这归因于高温成型过程中的混合化学反应。氧化oxide纳米晶体(Gd

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