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Highlights Of The 2002 National Electronic Manufacturing Technology Roadmaps And Their Applicability To China

机译:2002年全国电子制造技术路线图的重点及其在中国的适用性

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This presentation describes the roadmapping process used in North America, highlights key global results of the 2002 edition, and suggests how this roadmap and the roadmap process might benefit the electronics industry in China. The 2002 National Electronic Manufacturing Technology Roadmap (NEMI, 2002) was released by NEMI on April 1. 2003. This edition of the biennial roadmap is over 1000 pages long and was produced by over 350 individuals from over 170 industrial, government, and academic institutions in North America in cooperation with SIA (Semiconductor Industry Association), IPC, IMAPS (International Microelectronics and Packaging Society), USDC (United States Display Consortium), NSIC (National Storage Industry Consortium), and OIDA (Optoelectronics Industry Development Association). It contains eighteen individual technology roadmaps covering all aspects of the global electronics industry and its supply chain.
机译:本演讲介绍了北美使用的路线图制作过程,重点介绍了2002年版的全球主要成果,并提出了该路线图和路线图过程如何使中国的电子行业受益。 NEMI于2003年4月1日发布了2002年《国家电子制造技术路线图》(NEMI,2002年)。该版本的两年期路线图长达1000多页,由来自170多个工业,政府和学术机构的350多人制作在北美与SIA(半导体行业协会),IPC,IMAPS(国际微电子和包装协会),USDC(美国显示联盟),NSIC(国家存储行业联盟)和OIDA(光电行业发展协会)合作。它包含涵盖全球电子行业及其供应链各个方面的18条单独的技术路线图。

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