首页> 外文会议>2019 Electron Devices Technology and Manufacturing Conference >Microstructural Change in Crystal Grains during Phase Transformation of Hf-Zr-O Ferroelectric Thin Films
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Microstructural Change in Crystal Grains during Phase Transformation of Hf-Zr-O Ferroelectric Thin Films

机译:Hf-Zr-O铁电薄膜相变过程中晶粒的微观结构变化

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Phase transformation of Hf-Zr-O films with the annealing condition is investigated. It is shown that depending on the thermal budget applied to the Hf-Zr-O films, the transformation of crystal structures progresses in the order of the tetragonal phase, the orthorhombic phase, and finally the monoclinic phase. This trend is reflected on the emergence of ferroelectricity in Hf-Zr-O films. The stabilization of the metastable orthorhombic phase before transforming into the most stable monoclinic phase is discussed based on the mechanical stress caused by the volume change between crystal cells. Its evidence is demonstrated as the change of microstructure in the crystal grains.
机译:研究了退火条件下Hf-Zr-O薄膜的相变。结果表明,根据应用于Hf-Zr-O薄膜的热预算,晶体结构的转变按四方相,正交相,最后是单斜相的顺序进行。这种趋势反映在Hf-Zr-O薄膜中铁电的出现上。基于晶胞之间体积变化所引起的机械应力,讨论了亚稳正交晶相在转变成最稳定的单斜晶相之前的稳定性。其证据被证明为晶粒的微观结构的变化。

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