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TITANIUM DIOXIDE THIN FILM DEPOSITION ON POLYMER SUBSTRATES BY LIGHT INDUCED CHEMICAL VAPOR DEPOSITION

机译:光诱导的化学气相沉积法在聚合物基体上沉积二氧化钛薄膜

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摘要

Light induced chemical vapor deposits of titanium dioxide are achieved on PMMA substrates from titanium tetra-isopropoxide with a long pulse (250 ns) 308 nm XeCl Excimer laser. Similarly to other results on non-polymeric substrates, localized deposits are achieved using a mask projection set up and the deposited thickness is precisely controlled. This paper focuses on the limitations of the process on polymeric substrates due to laser induced thermal effects. Based on both experimental results and theoretical laser induced temperature rise simulations, the laser induced temperature rise is shown to be responsible for: (ⅰ) the limitation of the used laser fluence to values below 20 mJ/cm~2/pulse not to damage the substrate. (ⅱ) the manifestation of cracks in the deposited films above a certain deposited film thickness. (ⅲ) the low crystalline state and the 9% carbon contamination of the deposited material.
机译:用长脉冲(250 ns)308 nm XeCl受激准分子激光在四甲基异丙醇钛上在PMMA基板上实现了光诱导的化学气相沉积的二氧化钛沉积。与在非聚合基板上的其他结果类似,使用掩膜投影装置可以实现局部沉积,并且可以精确控制沉积厚度。由于激光诱导的热效应,本文重点介绍了该工艺在聚合物基材上的局限性。根据实验结果和理论上的激光诱导温度升高模拟,表明激光诱导温度升高是造成以下情况的原因:(ⅰ)使用的激光通量限制在20 mJ / cm〜2 / pulse以下,以免损坏激光束。基质。 (ⅱ)在一定沉积膜厚度以上的沉积膜中出现裂纹的表现。 (ⅲ)沉积材料的低结晶态和9%的碳污染。

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