首页> 外文会议>Electrochemical Society 2003 Spring Meeting and International Symposium on Semiconductor Wafer Bonding VII: Science, Technology, and Applications; 200304-200305; Paris; FR >FREQUENCY-DEPENDENT CONDUCTANCE AND CAPACITANCE OF THE UNIPOLAR SEMICONDUCTOR HOMOJUNCTION AND ESTIMATION OF INTERFACE-STATES PARAMETERS IN Si/Si DIRECTLY BONDED STRUCTURES
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FREQUENCY-DEPENDENT CONDUCTANCE AND CAPACITANCE OF THE UNIPOLAR SEMICONDUCTOR HOMOJUNCTION AND ESTIMATION OF INTERFACE-STATES PARAMETERS IN Si/Si DIRECTLY BONDED STRUCTURES

机译:Si / Si直接键合结构中单极半导体同质子的频率依赖性电导和电容以及界面态参数的估计

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摘要

Within the framework of the thermoionic model and with due regard for the action of interface states (ISs) as traps for majority carriers, we calculated the frequency-dependent small-signal complex conductivity Y~- of the unipolar semiconductor junction to subsequently discuss the possibility of extracting IS parameters from electrical measurements of bonded junctions. A short-cut procedure for evaluating IS parameters from capacitance and conductance data is developed, and estimates for real p-Si/p-Si directly bonded structures are given. These estimates show the real bonded junctions to be laterally non-uniform, with "punctures" present in their interfacial potential barrier.
机译:在热离子模型的框架内,并适当考虑了界面态(ISs)作为多数载流子的陷阱,我们计算了单极半导体结的频率相关小信号复电导率Y〜-,随后讨论了可能性从键合结的电气测量中提取IS参数的方法。建立了一种从电容和电导数据评估IS参数的快捷方法,并给出了对实际p-Si / p-Si直接键合结构的估计。这些估计表明,实际的键合连接在横向上是不均匀的,在其界面势垒中存在“穿刺”。

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