Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei, Taiwan, ROC;
Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei, Taiwan, ROC;
Department of Mechanical Eng., National Taiwan University, Taipei, Taiwan, ROC;
National Synchrotron Radiation Research Center, Hsinchu, Taiwan, ROC;
Department of Physics, National Tsing Hua University, Hsinchu, Taiwan, ROC;
Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei, Taiwan, ROC;
机译:针对先进的基于GaAs的CMOS器件的欧姆金属触点的优化
机译:通用溶液处理界面双层,可在有机和混合光电设备中实现欧姆接触
机译:通过快速热退火处理的低耐碳掺杂N型IngaAsbi薄膜的低抗性欧姆触点的表征
机译:高κ/ IngaAs,用于终极CMOS - 界面钝化,低欧姆触点和设备性能
机译:通过固相反应开发与n-Ga(或Al)(0.5)In(0.5)P的不尖峰欧姆接触以及对n-GaAs进行低温处理的欧姆接触
机译:掺Si的双面非合金欧姆接触等离子体电子器件的砷化镓
机译:在基于InP的光子膜的重掺杂n型InGaAs和InGaAsP上具有超低光学损耗的欧姆接触
机译:探讨/操纵高k电介质与InGaas之间的界面原子键合,实现终极CmOs。