Processing of lithographically defined Apex glass structures with smooth and transparent sidewalls

摘要

A process to improve the surface roughness and optical transparency of the sidewalls ofrnstructures made in ApexTM photosensitive glass is demonstrated. Improved sidewall roughness isrnachieved through a post- etch anneal that reflows the surface of the glass microstructure andrnreduces the size of roughened glass nodules on the Hydrofluoric acid etched surface. The samernanneal process is equally suited for bonding between substrates as the surface of the glass isrnmelted allowing the glass to reflow across the seam of the bond. The resulting glassrnmicrostructures demonstrate an average sidewall surface roughness that is reduced from nearlyrn0.70 μm to 22 nm and can be used as for optical signal detection in microfluidic devices.