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CHARACTERIZATION OF AMORPHOUS VACUUM-EVAPORATED SnO_2 THIN FILMS

机译:非晶态真空蒸发的SnO_2薄膜的表征

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摘要

Tin oxide (SnO_2) thin films of thicknesses in the range 100-600 nm were prepared on glass substrates by vacuum evaporation at ambient temperature. The films were characterized by transmittance measurements, X-ray diffraction (XRD), scanning electron microscope (SEM) observations and energy dispersion X-ray analysis (EDAX). It is found that the films have high transmittance and non sharp absorption edges. XRD diffractograms showed that the films are amorphous and the SEM micrographs showed that the surfaces are smooth, uniform and well covered with the material. The EDAX analysis showed that the films are deficient in oxygen. Indirect optical bandgap energy and Urbach tailing in the bandgap was observed, and the width of the tail, which is related with disorder and localized states, was estimated.
机译:通过在环境温度下真空蒸发在玻璃基板上制备厚度为100-600 nm的氧化锡(SnO_2)薄膜。通过透射率测量,X射线衍射(XRD),扫描电子显微镜(SEM)观察和能量色散X射线分析(EDAX)对薄膜进行表征。发现该膜具有高透射率和不锋利的吸收边缘。 XRD衍射图表明该膜是无定形的,而SEM显微图表明该表面是光滑的,均匀的并且被材料很好地覆盖。 EDAX分析表明该膜缺氧。观察到间接带隙能和带隙中的Urbach拖尾,并估计了与无序和局部状态有关的尾巴宽度。

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