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【6h】

Resist Dissolution Behavior according to Protecting Group in Polymer

【摘要】 In DUV CAR resists, deprotecting reaction and dissolution behavior depend upon the bulkiness and activation energy of protecting group. These factors have influences on resist performance (resolution, focus and exposure latitude margin, line width roughness). For further understanding this behavior, we investigated the dissolution parameters of resist related to the bulkiness, activation energy of protecting group, and we confirmed their effects on the resist performance using lithography evaluation. We will report and discuss the effect of structure and chemical properties of each protecting group on the dissolution behavior of resist in detail in this paper.

【会议名称】 Advances in Resist Technology and Processing XXIII pt.2

【会议地点】San JoseCA(US)

【作者】 Kwanghwyi Im; Jin Jegal; Jungkook Park; Deogbae Kim; Jaehyun Kim;

【作者单位】 Electronic Material Division, Dongjin Semichem Inc., Ltd., 625-3, Yodang-Ri, Yanggam-Myun, Hwasung-City, Kyungki-Do, Korea, 445-930;

【会议组织】

【会议召开年】 2006

【页码】P.61533Q.1-61533Q.11

【总页数】11

【原文格式】PDF

【正文语种】eng

【中图分类】TN304;

【原文服务方】国家工程技术数字图书馆

【关键词】chemically amplified resist;dissolution behavior;deprotecting reaction;bulkiness;activation energy;

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