A surface profiler system with a high accuracy of the order of nanometers has been developed for a half-meter-long X-ray mirror. This system is based on microstitching interferometer (MSI) and relative angle determinable stitching interferometer (RADS1). Using elastic hinges and linear actuators, we designed the 5-axis- and 6-axis stages for the MSI and RADSl, respectively, for the half-meter-long X-ray mirror. A test mirror of length 0.5 m was used to measure the height accuracy (1.4 nm in rms) and lateral resolution (36 μm) of the proposed system.
Advances in Metrology for X-Ray and EUV Optics II; Proceedings of SPIE-The International Society for Optical Engineering; vol.6704
Light source Optics Division, Japan Synchrotron Radiation Institute (JASRI/SPring-8), 1-1-1 Koto Sayo, Hyogo, Japan 678-5198;
JTEC Corporation, 5-5-2 Minatojima-minami, Kobe, Hyogo, Japan 650-0047;
Graduate School .of Engineering, Osaka University, 2-1;
【关键词】x-ray;synchrotron radiation;mirror;stitching interferometer;