Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror

摘要

A surface profiler system with a high accuracy of the order of nanometers has been developed for a half-meter-long X-ray mirror. This system is based on microstitching interferometer (MSI) and relative angle determinable stitching interferometer (RADS1). Using elastic hinges and linear actuators, we designed the 5-axis- and 6-axis stages for the MSI and RADSl, respectively, for the half-meter-long X-ray mirror. A test mirror of length 0.5 m was used to measure the height accuracy (1.4 nm in rms) and lateral resolution (36 μm) of the proposed system.