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Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror

【摘要】 A surface profiler system with a high accuracy of the order of nanometers has been developed for a half-meter-long X-ray mirror. This system is based on microstitching interferometer (MSI) and relative angle determinable stitching interferometer (RADS1). Using elastic hinges and linear actuators, we designed the 5-axis- and 6-axis stages for the MSI and RADSl, respectively, for the half-meter-long X-ray mirror. A test mirror of length 0.5 m was used to measure the height accuracy (1.4 nm in rms) and lateral resolution (36 μm) of the proposed system.

【会议名称】 Advances in Metrology for X-Ray and EUV Optics II; Proceedings of SPIE-The International Society for Optical Engineering; vol.6704

【会议地点】San DiegoCA(US)

【作者】 Haruhiko Ohashi; Takashi Tsumufa; Hiromi Okada; Hidekazu Mimura; Tatsuhiko Masunaga; Yasunori Senba; Shunji Goto; Kazuto Yamauchi; Tetsuya Ishikawa;

【作者单位】 Light source Optics Division, Japan Synchrotron Radiation Institute (JASRI/SPring-8), 1-1-1 Koto Sayo, Hyogo, Japan 678-5198; JTEC Corporation, 5-5-2 Minatojima-minami, Kobe, Hyogo, Japan 650-0047; Graduate School .of Engineering, Osaka University, 2-1;

【会议组织】

【会议召开年】 2007

【页码】P.4.1-4.8

【总页数】8

【原文格式】PDF

【正文语种】eng

【中图分类】TH741;

【关键词】x-ray;synchrotron radiation;mirror;stitching interferometer;

【原文服务方】国家工程技术数字图书馆

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