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Impurity Segregation to Scale/Alloy Interfaces and its Effect on Interfacial Properties

机译:杂质对尺度/合金界面的偏析及其对界面性质的影响

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This paper summarizes experimental results on the chemical changes at Al_2O_3/alloy interfaces as a function of oxidation time, temperature and cooling rates. Surfaces of FeCrAl, FeAl and Fe_3,Al alloys after removal of the scale in ultra high vacuum were analyzed using an Auger microprobe. Sulfur was the only segregant on FeAl and Fe_3Al, but C and Cr were also present on FeCrAl, where all of the C and some of the Cr segregated during cooling. The S content on FeCrAl built up quickly with oxidation time, reaching a saturation level with rates in accordance with sulfur diffusivity in the alloy. The final concentration on FeAl and Fe,Al was only half that of saturation. On Fe_3Al, S strongly segregated upon initial oxidation; it then desegregated from the interface before slowly building up again to a constant level. The strong initial segregation, however, was not found on FeAl. These results indicate that segregation to oxide/metal interfaces closely resembles that to free surfaces and alloy grain boundaries, where interface microstructurc and co-segregation effects dictate the final concentration. A unique feature on growing oxide/meal interfaces is that this concentration can change with time according to changes in interfacial structures as a result of scale growth. Preliminary results on scale spallation behaviors did not indicate a strong relationship between the amount of interfacial sulfur and the interface fracture resistance, whose strength was more heavily related to interfacial pore density.
机译:本文总结了Al_2O_3 /合金界面化学变化随氧化时间,温度和冷却速率变化的实验结果。使用俄歇(Auger)微探针分析了在超高真空下去除氧化皮后的FeCrAl,FeAl和Fe_3,Al合金表面。硫是FeAl和Fe_3Al上的唯一隔离剂,但FeCrAl上也存在C和Cr,在冷却过程中,所有C和某些Cr都偏析。 FeCrAl上的S含量随氧化时间迅速增加,达到饱和水平,其速率与合金中硫的扩散率相对应。 FeAl和Fe,Al的最终浓度仅为饱和浓度的一半。在Fe_3Al上,S在初始氧化时强烈偏析;然后将其从界面中分离出来,然后再缓慢地建立到一个恒定的水平。然而,在FeAl上未发现强烈的初始偏析。这些结果表明,氧化物/金属界面的偏析与自由表面和合金晶界的偏析非常相似,其中界面的微观结构和共偏析效应决定了最终浓度。生长的氧化物/金属界面的独特之处在于,随着水垢生长,该浓度会随着界面结构的变化而随时间变化。鳞片剥落行为的初步结果并未表明界面硫的含量与界面抗裂性之间有很强的关系,而界面抗裂强度与界面孔隙密度关系更大。

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