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【6h】 MOBILE METROLOGY FOR ADVANCED PHOTOMASK MANUFACTURING

【摘要】Accuracy and fabrication cost of optical masks continue to be major concerns for the semiconductor industry. While immersion and other process technologies promise to extend optical lithography down to the 45nm node, the resulting technical and commercial requirements for the mask fabrication process become increasingly difficult to achieve. Potential solutions that are readily available to wafer fabricators are either too expensive to deploy or have not been commercialized for mask manufactures- up until now. Mobile metrology has the inherent ability to provide the required measurement accuracy, on any tool, at a low cost of ownership. This paper will discuss the application of a self-contained, wireless SensorPlate for providing process optimization and control within a leading mask blank manufacturing facility. Three critical process steps are characterized: Quartz Cleaning, Chromium Physical Vapor Deposition, and Photoresist Post-Applied Baking. Process optimization was completed to achieve improved performance of the mask blank product.

【会议名称】 Annual BACUS Symposium on Photomask Technology pt.1; 20051004-07; Monterey,CA(US)

【会议地点】Monterey,CA(US)

【作者】Paul MacDonald;Michael P. Goudy;Devi Koty;Henryson Omoregie;M. David Webster;

【作者单位】On Wafer Technologies;

【会议组织】

【会议召开年】2005

【页码】P.59921J.1-59921J.10

【总页数】10

【原文格式】PDF

【正文语种】eng

【中图分类】TN305.7;

【关键词】;

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