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【6h】 Post coat delay effects on chemically amplified resists and storage condition impacts

【摘要】Critical dimension (CD) requirements are continually tightening for mask manufacturing for mean to target and uniformity control as advanced technology nodes are introduced. In addition, the CD repeatability of structures relevant to optical proximity correction is also becoming more critical with each advancing node. Chemically amplified resists commonly in use in the mask industry are sensitive to post coat delay (PCD), storage and handling conditions, and environmental contaminants. In this paper, the CD sensitivity of a commonly used photoresist is characterized as a function of post coat delay. The impact to average CD, uniformity, linearity, thru pitch, clear to dark, and e-beam proximity effect are all examined. An analysis of post develop resist thickness loss is presented to supplement the understanding of CD uniformity behavior. In addition, the impact of several storage scenarios is evaluated including storage in a sealed foil bag, an unsealed dry nitrogen environment, and storage boxes made from two different materials. The impact of storage conditions on CD uniformity is critical and is shown to be strongly influenced by the choice of material for the containers and the storage environment.

【会议名称】 Annual BACUS Symposium on Photomask Technology pt.1; 20051004-07; Monterey,CA(US)

【会议地点】Monterey,CA(US)

【作者】Daniel B. Sullivan;Kenneth C. Racette;Monica J. Barrett;R. Brian Couture;

【作者单位】IBM Systems Technology Group, 1000 River Road, Essex Junction, VT, USA 05452;

【会议组织】

【会议召开年】2005

【页码】P.59920L.1-59920L.10

【总页数】10

【原文格式】PDF

【正文语种】eng

【中图分类】TN305.7;

【关键词】chemically amplified resist;post coat delay;photoresist;critical dimension control;storage conditions;

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