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Ab initio DFT Study of Ideal Strength of Crystal and Surfaces in Covalent Systems

机译:从头开始DFT研究共价体系中晶体和表面的理想强度

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摘要

Ab initio density functional theory (DFT) calculations were performed to examine various factors which may influence the ideal strength, namely multiaxial loading condition and structure with low symmetry. First, the effect of normal stress on the ideal shear strength (ISS) in covalent crystals, Si, C, Ge and SiC, was evaluated. It was found that the response of ISS to normal stress differs depending on the material, while in metals the trend is unchanged. Obtained ISS as a function of normal stress is useful to understand criteria of dislocation nucleation in a pristine crystal because local lattices at the nucleation site undergo superimposed stress components in experiment. Secondly the ideal tensile strength of silicon surface was evaluated to examine how atomistic-level structure affects the mechanical property. The theoretical tensile strength of Si nanofilms with (100) surface, which is flat with dimer-row structures, shows only 20-30% reduction even though the thickness is down to 1 nm, meaning that the flat surface possesses high strength.
机译:进行了从头算密度泛函理论(DFT)计算,以研究可能影响理想强度的各种因素,即多轴加载条件和低对称性结构。首先,评估了法向应力对共价晶体Si,C,Ge和SiC中理想剪切强度(ISS)的影响。已经发现,ISS对法向应力的响应因材料而异,而在金属中,趋势不变。获得的ISS作为正应力的函数对于理解原始晶体中位错成核的标准很有用,因为在实验中成核部位的局部晶格经历了叠加的应力分量。其次,评估了硅表面的理想拉伸强度,以检查原子级结构如何影响机械性能。具有二聚物行结构的平坦的具有(100)表面的Si纳米膜的理论拉伸强度即使厚度降低到1 nm,也仅显示20-30%的降低,这意味着平坦的表面具有很高的强度。

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