The Effect of Substrate Temperature for Thermal and True Stress on Magnetostrictive Thin Films

摘要

In this study, the internal stress in magnetostrictive thin films was evaluated by the changes in substrate temperature during the deposition. Internal stress of films was strongly dependent on thermal stress. Despite the control of ion bombardment, the values of true stress for the films were not continuous. This suggests that true stress of sputtered magnetostrictive thin films is governed by not only ion bombardment but also microstructural changes with changing in substrate temperature.