首页> 中文会议>第二届中国国际集成电路研讨会 >Opto Lithographic technologies for photomasks'production and components' forming for IC packing by Flip Chip method

Opto Lithographic technologies for photomasks'production and components' forming for IC packing by Flip Chip method

摘要

The technologies of poto and laser lithography are widely used in IC production of different complexity,in semiconductor devices'production and also in production of hybrid circuits and precise circuit boards. The results of tests and also taking into account the demands of the production engineers of Bumping processallowed us to formulate the demands towards projectionoptics of new Bumping stepper EM-5534, which has noanalogues among photolithography equipment for thistechnology in the world.

著录项

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号