A method suitable for use in the fabrication of a van der Waals heterostructure, the method comprises the steps of applying a mask 16 to a substrate 14, rubbing a first material 12 against the substrate 14 to deposit and apply, by abrasion, a first layer of the first material to the substrate 14, applying a second mask over the first layer, and rubbing a second material against the substrate 14 to apply, by abrasion, a second layer of the second material over at least part of the first layer. The second material may be less hard or less abrasive than the first material 12. The first and second materials may be applied using a rotatable head 10. A further step may include the transfer of a prefabricated element which may comprise a layer formed by CVD. A multi-layered structure formed using this method is specified, where the structure may further comprise a photo detector, a light emitting device, a transistor, a capacitor, a resistor, a superconducting memory device, a single photon emitter located on a film, a triboelectric generator or a hydrogen evolution catalyst.
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