首页> 外国专利> DIAMOND BRIDGE OR DIAMOND CANTILEVER, THEIR MANUFACTURE AND ELECTRONIC DEVICE USING SUCH DIAMOND BRIDGE OR CANTILEVER

DIAMOND BRIDGE OR DIAMOND CANTILEVER, THEIR MANUFACTURE AND ELECTRONIC DEVICE USING SUCH DIAMOND BRIDGE OR CANTILEVER

机译:DIAMOND BRIDGE或DIAMOND悬臂,其制造和使用此类DIAMOND BRIDGE或ANTILEVER的电子设备

摘要

PURPOSE: To provide a diamond bridge, a diamond cantilever, a method for their manufacture, and a mass-producible electronic device using such a diamond bridge or cantilever, wherein favorable environment resistance, sufficient dimensional accuracy and strength are obtained, and wherein relatively simple manufacture is implemented. ;CONSTITUTION: A diamond film 3 is formed on a substrate 1 of silicon or the like. There is a gap 2 between the diamond film and the substrate, and the gap 2 is formed by forming the diamond film across the surface of the substrate and a sacrificial layer, temporarily formed, and then removing the sacrificial layer. Specifically, the gap between the diamond film and the substrate is formed as follows: An oxide film is formed on a substrate of silicon or the like. After the oxide film is scratched, a part of it is removed to expose the surface of the substrate. Resist is applied to the exposed surface and a part of the oxide film connecting to the exposed surface, which is to make a sacrificial layer. Ion is implanted, and the resist is stripped. A diamond film is formed there, and a sacrificial layer of the oxide film and the remaining oxide film are removed. Thus the gap is formed between the diamond film and the substrate.;COPYRIGHT: (C)1996,JPO
机译:用途:提供一种金刚石桥,金刚石悬臂,其制造方法以及使用这种金刚石桥或悬臂的可大量生产的电子设备,其中获得了有利的耐环境性,足够的尺寸精度和强度,并且其中相对简单制造得以实现。 ;组成:金刚石膜3形成在硅等衬底1上。在金刚石膜和基板之间存在间隙2,并且间隙2是通过在基板和牺牲层的表面上形成金刚石膜,临时形成并随后去除牺牲层而形成的。具体地,金刚石膜与基板之间的间隙形成如下:在硅等基板上形成氧化膜。在刮擦氧化膜之后,将其一部分去除以暴露衬底的表面。将抗蚀剂施加到暴露的表面上,并将一部分氧化膜连接到暴露的表面上,以形成牺牲层。注入离子,并剥离抗蚀剂。在那里形成金刚石膜,并且去除氧化膜的牺牲层和剩余的氧化膜。因此,在金刚石膜和基底之间形成了间隙。;版权所有:(C)1996,日本特许厅

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