Production method null of composition and its production method for metallic oxide thin film pattern formation, formation method and electronic part and optical part of metallic oxide thin film

摘要

PURPOSE: To efficiently form a metal oxide thin film pattern by photoirradiation with a small amt. of energy at the time of forming the metal oxide thin film pattern by a sol-gel method. ;CONSTITUTION: This composition for forming a metal oxide thin film pattern contains 0.05-6 mols of a nitrofuran derivative per mol of a metal alkoxide. The composition is applied on a substrate to be irradiated with light and patterned by utilizing the difference in solubility between the irradiated part and unirradiated part due to the photolysis reaction of the irradiated part. The nitrofuran derivative reacts easily with the metal alkoxide to form a highly photoreactive metallic compd. This metallic compd. decomposes easily upon absorbing light to form a metallic compd. having a solubility largely different from that of the original metal alkoxide, and hence a large solubility difference is obtained with a small amt. of irradiation energy.;COPYRIGHT: (C)1996,JPO