Diffraction grating finishing comprises forming photosensitive resist layer on base material, emitting near field light onto resist layer, forming diffraction grating pattern in the resist layer, and etching base material

摘要

Diffraction grating finishing process comprises forming a photosensitive resist layer (23) on a base material (11), emitting near field light onto the resist layer using a device to emit near field light corresponding to diffraction grating pattern on obtaining the light, forming diffraction grating pattern in the resist layer whilst developing, and producing a diffraction grating in the base material by etching the material. The pattern functions as an etching mask in the resist layer.