EXAMINATION METHOD OF PATTERN OR MASK FOR EXPOSURE, PREPARATION METHOD OF PATTERN OR MASK FOR EXPOSURE AND PATTERN OR MASK FOR EXPOSURE TO ALLOW PATTERN OR MASK FOR EXPOSURE TO BE COMPARED EASILY WITH HIGH PRECISION BY INCREASING NUMBER OR PATTERNS FOR EXAMINATION AS COMPARING OBJECT

摘要

PURPOSE: A method for examining a pattern or mask for exposure, a method for preparing a pattern or mask for exposure and a pattern or mask for exposure are provided, to allow a pattern or mask for exposure to be compared easily with high precision by increasing the number of patterns for examination as a comparing object and to increase the arrangement freedom degree of a pattern part for examination. CONSTITUTION: The examination method comprises the steps of locating at least some part of a mask pattern part and a plurality of pattern parts for examination of an identical pattern to the outside and/or inside of the mask pattern part in the pattern or mask for exposure; and comparing the at least some part of the mask pattern part with the pattern part for examination. Preferably the pattern parts for examination is twice or more as many as the at least some part of the mask pattern part. Preferably the mask pattern part is formed by a penetration hole of a certain pattern where the exposure beam transmits and a concave part having a pattern corresponding to the pattern part for examination is formed.