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ULTRA SURFACE SMOOTHING DEVICE OF ITO THIN FILM AND METHOD THEREOF USING GAS CLUSTER ION BEAM
ULTRA SURFACE SMOOTHING DEVICE OF ITO THIN FILM AND METHOD THEREOF USING GAS CLUSTER ION BEAM
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机译:ITO薄膜的超表面平滑装置及其使用气体簇离子束的方法
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摘要
A surface smoothing device and method thereof which flattens a surface of a sample by irradiating ionized gas of cluster state comprises: an operating gas supplying device for supplying operating gas; a diffusion chamber connected to a convergent and divergent nozzle which changes the operating gas supplied from the operating gas supplying device into cluster state; a source chamber including a skimmer connected to the diffusion chamber for extracting a part of the operating gas in cluster state, and an ionizing device for ionizing the operating gas of cluster state selected by the skimmer; an acceleration chamber including a lens for increasing a density of the cluster ion beam current, and an accelerating device for accelerating the cluster ion; and a process chamber in which the accelerated cluster ion is irradiated on a sample of ITO thin film to flatten the surface of the sample.
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