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Alignment mark and alignment method using the same for photolithography to eliminating process bias error
Alignment mark and alignment method using the same for photolithography to eliminating process bias error
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机译:对准标记和使用该对准标记的光刻方法,以消除工艺偏差误差
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摘要
An alignment mark is made of at least two nonparallel trenches having two reducing-width-to-zero ends. The displacement bias error, produced by a process bias error, of the centerlines of the trenches is zero where the width of the two trenches is zero. Hence, the alignment target on a substrate can be reproduced.
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