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Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool
Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool
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机译:整个芯片上的抗蚀剂的特征尺寸各不相同,而没有掩模写入工具带来的“栅格捕捉”现象
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摘要
A method for creating a pattern on a substrate, the method includes the steps of imprinting a first pattern on the substrate; and imprinting a second substantially similar pattern which is mis-registered with regard to the first pattern so that the combination of the first and second patterns cause a systematic variation in a final size of defined elements across the substrate.
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