首页> 外国专利> Production of low stress non-(111) oriented large volume single crystals with low stress related birefringence and homogenous refractive index, as well as their application

Production of low stress non-(111) oriented large volume single crystals with low stress related birefringence and homogenous refractive index, as well as their application

机译:具有低应力相关双折射和均质折射率的低应力非(111)取向大体积单晶的制备及其应用

摘要

Process for preparation especially of a non-111 oriented sliding plane large volume low stress crystal of low double refraction stress and homogeneous refraction index involves growth and tempering of the crystal with stress relaxation along its sliding plane obtained by heat introduction and formation of a temperature gradient, where in tempering the direction of heat input and/or the heat removal in cooling makes an angle with the sliding plane greater than 5 degrees. An independent claim is included for a homogeneous CaF2 crystal of homogeneous refractive index less than 0.025.10 -6 (RMS value), and stress double refraction in the 100-direction of less than 1 nm/cm (PV) and/or less than 0.35 nm/cm (RMS).
机译:特别是制备具有低双折射和均一折射率的非111取向的滑动面大体积低应力晶体的方法,该方法包括通过热导入和形成温度梯度获得的沿其滑动面的应力松弛的晶体生长和回火。在回火过程中,热量输入的方向和/或冷却过程中的热量散失会导致与滑动平面的夹角大于5度。对于均质折射率小于0.025.10-> 6(RMS值)且在100方向上的应力双折射小于1 nm / cm(PV)和/或更低的均质CaF2晶体,包括一个独立权利要求大于0.35 nm / cm(RMS)。

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