首页> 外国专利> HETEROJUNCTION STRUCTURE OF P-TYPE SEMICONDUCTOR THIN FILM AND ZnO BASED NANO-BAR, MANUFACTURING METHOD THEREOF AND DEVICE USING THE SAME FOR EMBODYING EASILY CORRESPONDING DEVICE WITH HETEROJUNCTION STRUCTURE AT ROOM TEMPERATURE AND HIGH TEMPERATURE WITHOUT DEGRADATION OF EFFICIENCY

HETEROJUNCTION STRUCTURE OF P-TYPE SEMICONDUCTOR THIN FILM AND ZnO BASED NANO-BAR, MANUFACTURING METHOD THEREOF AND DEVICE USING THE SAME FOR EMBODYING EASILY CORRESPONDING DEVICE WITH HETEROJUNCTION STRUCTURE AT ROOM TEMPERATURE AND HIGH TEMPERATURE WITHOUT DEGRADATION OF EFFICIENCY

机译:P型半导体薄膜和ZnO基纳米棒的异质结结构,其制造方法和装置,该方法适用于在室温和高温下随温度变化而容易地使具有异质结结构的器件嵌入室温

摘要

PURPOSE: A heterojunction structure of a P-type semiconductor thin film and a ZnO based nano-bar, a manufacturing method thereof and a device using the same are provided to embody easily a corresponding device with heterojunction structure at a room temperature and at a high temperature without the degradation of efficiency by using high exciton binding energy of ZnO. CONSTITUTION: A plurality of N-type ZnO based nano-bars are vertically grown on a P-type semiconductor thin film. The ZnO of each nano-bar has high exciton binding energy, so that a heterojunction structure is easily realized. A band gap of P-type semiconductor is in a range of 1.5 to 4.5 eV.
机译:用途:提供P型半导体薄膜和ZnO基纳米棒的异质结结构,其制造方法以及使用该异质结结构的器件,以便在室温和高温下容易地实现具有异质结结构的相应器件。通过使用高的ZnO激子结合能,温度不会降低效率。组成:多个N型ZnO基纳米棒垂直生长在P型半导体薄膜上。每个纳米棒的ZnO具有高的激子结合能,因此易于实现异质结结构。 P型半导体的带隙在1.5至4.5eV的范围内。

著录项

  • 公开/公告号KR20050001582A

    专利类型

  • 公开/公告日2005-01-07

    原文格式PDF

  • 申请/专利权人 POSTECH FOUNDATION;

    申请/专利号KR20030041813

  • 发明设计人 PARK WON IL;YI GYU CHUL;

    申请日2003-06-26

  • 分类号H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 22:06:08

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