首页> 外国专利> ANTI-REFLECTION FILM, MANUFACTURING METHOD THEREOF, POLARIZING PLATE USING THE ANTI-REFLECTION FILM, AND IMAGE DISPLAY DEVICE USING THE ANTI-REFLECTION FILM OR POLARIZING PLATE

ANTI-REFLECTION FILM, MANUFACTURING METHOD THEREOF, POLARIZING PLATE USING THE ANTI-REFLECTION FILM, AND IMAGE DISPLAY DEVICE USING THE ANTI-REFLECTION FILM OR POLARIZING PLATE

机译:抗反射膜,其制造方法,使用抗反射膜对板进行极化,以及使用抗反射膜或极化板的图像显示装置

摘要

PPROBLEM TO BE SOLVED: To provide an anti-reflection film which can be manufactured at a low cost and with high productivity, and has ample anti-reflection performances, abrasion resistance, and staining property, a manufacturing method thereof, a polarizing plate and an image display device that uses such a superior anti-reflection film. PSOLUTION: The anti-reflection film, whose low refractive layer is located most distant from a support, comprises a resin curable upon irradiation of ionizing radiation, and a compound having a polysiloxane partial structure, and in which the ratio SiSB(a)/SB/SiSB(b)/SBof the photoelectron spectral intensity äSiSB(a)/SB} of silicon atoms on the outermost surface of the low-refractive layer to the photoelectron spectral intensity äSiSB(b)/SB} of silicon atoms at a deeper position, corresponding to 80% of the thickness of the low refractive layer from the outermost surface, is 5.0 or larger. PCOPYRIGHT: (C)2007,JPO&INPIT
机译:

要解决的问题:提供一种可以以低成本和高生产率制造并且具有足够的抗反射性能,耐磨性和耐污染性的抗反射膜,其制造方法,偏光片板和使用这种优异的抗反射膜的图像显示装置。

解决方案:该抗反射膜的低折射层位于距支撑体最远的位置,该抗反射膜包含在电离辐射的照射下可固化的树脂和具有聚硅氧烷部分结构的化合物,且其中Si (a)}>(a) / Si (b)较深位置的硅原子的光电子能谱强度äSi(b)}等于5.0或更大,这对应于从最外表面开始的低折射层厚度的80%。

版权:(C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP2006293329A

    专利类型

  • 公开/公告日2006-10-26

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO LTD;

    申请/专利号JP20060064642

  • 发明设计人 YONEYAMA HIROYUKI;OKAMOTO YASUHIRO;

    申请日2006-03-09

  • 分类号G02B1/11;C08F290/12;B32B7/02;B32B27;G02F1/1335;G09F9;

  • 国家 JP

  • 入库时间 2022-08-21 21:56:47

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