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Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film

机译:金属膜和金属膜被覆部件,金属氧化物膜和金属氧化物被膜覆盖部件,用于形成金属膜和金属氧化物被膜的薄膜形成装置以及薄膜形成方法

摘要

The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.
机译:本发明的金属膜是具有非常低的表面粗糙度和非常好的晶体取向的单晶致密膜,这是因为表面的算术平均粗糙度不大于2nm并且X-的(111)峰强度为-射线衍射不少于所有其他峰之和的20倍。另外,本发明的金属氧化物膜是致密膜,其具有较少的氧缺陷并且在其中几乎没有空隙,这是因为非氧化金属的含量不高于构成该金属氧化物的金属组分和1摩尔%的金属。堆积密度为0.98或更高。

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