PROCESSING DEVICE MULTIVARIATE ANALYSIS MODEL CREATION METHOD, PROCESSING DEVICE MULTIVARIATE ANALYSIS METHOD, PROCESSING DEVICE CONTROL DEVICE, PROCESSING DEVICE CONTROL SYSTEM

摘要

In the present invention, for example, the detection data that is detected from each of the plurality of sensor time for the plasma processing apparatus (100A) and this plasma processing apparatus (100B) of the same type as the reference when the operation by the first set of data each after the multivariate analysis create a respective multivariate analysis model equation, when activated by a new second set of data using the detected data detected from a plurality of sensors of a plasma processing apparatus (100A) and create the multivariate analysis model equation, a multivariate analysis model of the new first plasma processing apparatus corresponding to the new second set of data to two multivariate analysis model of setting a plasma processing apparatus (100A) of the data expression using a multivariate analysis model expression of a plasma processing apparatus (100B) (100B) create a formula. According to this, for example, even if the car if the process attributes for each processing unit, can be applied as the model equation written for one processing unit to another processing unit of the same, by taking the number of the measurement data for each processing unit that If you do not create a model equation it is completed every time. This makes it possible to reduce the labor and time of the model equation creating.