WATER-QUALITY EVALUATION METHOD, ULTRAPURE WATER EVALUATION DEVICE USING THE SAME AND ULTRAPURE WATER PRODUCING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a water-quality evaluation method for readily evaluating the etching functionality of ultrapure water used as washing water for manufacturing a semiconductor or a liquid crystal, using the degree of effects with respect to a silicon substance as an index, an ultrapure water evaluation device that uses it, and an ultrapure water producing system equipped with the ultrapure water evaluation device.;SOLUTION: Sample water, such as ultrapure water manufactured by an ultrapure water producing apparatus is brought into contact with the silicon substance, the concentration of dissolved hydrogen in the sample water, after the contact with the silicon substance has been measured, the amount of rising corresponding to the concentration of the dissolved hydrogen in the sample water, before the contact with the silicon substance, is calculated, and on the basis of the amount corresponding to the rise in the concentration of the dissolved hydrogen, it is decided whether the sample water has properties for etching silicon surface.;COPYRIGHT: (C)2007,JPO&INPIT