Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements

摘要

Determination of thin metal film dielectric function and layer thicknesses using simultaneous transmission spectroscopic ellipsometric (SE) and transmission intensity (T) measurements obtained in-situ to break correlation between thickness and optical constants of very thin absorbing films, preferably using only A.C. Components of ellipsometric and intensity characterizing electromagnetic radiation which transmits through said substrate and enters a detector.