STEP-OVER LITHOGRAPHY TO PRODUCE PARABOLIC PHOTORESIST PROFILES FOR MICROLENS FORMATION

摘要

PROBLEM TO BE SOLVED: To provide technique to customize to a system fit to a lens for each color.;SOLUTION: A method of microlens fabrication for use in a photosensor includes a stage for preparing a photodetector element array which is sensitive to light in a specific color domain, and a stage for depositing microlens material on the photodetector element array. The structure is coated with photoresist, and the photoresist is masked and exposed in a separate exposure for each color in the color domain. The photoresist is developed and the microlens material is etched to form a microlens array.;COPYRIGHT: (C)2008,JPO&INPIT