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Precursor molecule deposition method for semiconductor-type product e.g. three-dimensional capacitor, involves applying electric field during exposing the substrate so as to adsorb precursor molecules on substrate
Precursor molecule deposition method for semiconductor-type product e.g. three-dimensional capacitor, involves applying electric field during exposing the substrate so as to adsorb precursor molecules on substrate
The method involves exposing the substrate to precursor in the gaseous phase with the precursor molecules presenting a non-zero dipole moment and applying an electric field during exposing the substrate so as to adsorb precursor molecules on substrate.
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