Being thickness of the film which was formed on the substrate which possesses the surface which shows the thickness of the film or manner, and the optical surface analytical

摘要

PROBLEM TO BE SOLVED: To provide a method for optically measuring the thickness or optical characteristic values of a film and capable of reducing deviations in measured values due to the optical anisotropy of the surfaces of substrates.;SOLUTION: In a process S1, incident light 25 is sequentially irradiated at a plurality of angles (for example, THETA 1, THETA 2, THETA 3, etc.) on an axis Ax to measure the thickness of the film 21 through the use of an elliptically polarized analytical method, and coefficients indicating optical anisotropy are determined for every angle through the use of measured values of the thickness or optical characteristics of the film at each angle of the plurality of angles. In a process S2, measured values acquired by measuring the thickness of the film 21 by the irradiation of the incident light 25 through the use of the elliptically polarized analytical method or the optical characteristic values of the film are corrected through the use of the coefficients to acquire the thickness of the film 21.;COPYRIGHT: (C)2005,JPO&NCIPI