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ION SOURCE WITH CONTROLLED SUPERPOSITION OF ELECTROSTATIC AND GAS FLOW FIELDS
ION SOURCE WITH CONTROLLED SUPERPOSITION OF ELECTROSTATIC AND GAS FLOW FIELDS
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机译:静电场和气流场叠加受控的离子源
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摘要
Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.
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