Rule base OPC evaluating method, and simulation base OPC model evaluating method

摘要

Evaluation of line width control provides a rule-based OPC method of evaluation and the evaluation method of the simulation base OPC model that can accurately. By inputting the design data of the mask pattern on the mask in the rule base OPC for evaluation, based on the mask pattern of the mask for evaluation obtained correction data to produce a wafer for evaluation, and measures the length of the gate pattern of the wafer for evaluation. Simulation data on the basis of the simulation model base OPC calibration process (calibration) are made corresponding to the gate pattern of the front wafer for evaluation are output. By comparing the measured data with simulated data of the evaluation gate patterns, it evaluates the rule base OPC. ; Line width, the rule base OPC, wafer, calibration, simulation