首页> 外国专利> Complementary MOS image sensor, has photodiode including part with contact electrically connected to gate of read transistor, and another part with N-type region covered by P-type region electrically connected to potential of substrate

Complementary MOS image sensor, has photodiode including part with contact electrically connected to gate of read transistor, and another part with N-type region covered by P-type region electrically connected to potential of substrate

机译:互补型MOS图像传感器,其光电二极管包括一部分,其触点电连接到读取晶体管的栅极,另一部分的N型区域被P型区域覆盖,该P型区域电连接到衬底的电势

摘要

The sensor has a reinitializing gate (GR) adjacent to a photodiode (PD) of each of complementary MOS pixels to discharge charges of the photodiode to a drain (DR). The photodiode has two distinct parts (PD1, PD2) that are not adjacent and adjacent to the gate, respectively. The part (PD1) has an N-type region (12) in a P-type substrate (10) and an electrical contact (16) electrically connected to a gate of a read transistor (TL) e.g. voltage follower transistor. The part (PD2) has an N-type region (14) covered by a P-type region (18) electrically connected to potential of the substrate.
机译:传感器具有与每个互补MOS像素的光电二极管(PD)相邻的重新初始化门(GR),以将光电二极管的电荷放电到漏极(DR)。光电二极管具有两个不同的部分(PD1,PD2),它们分别与栅极不相邻。部件(PD1)在P型衬底(10)中具有N型区域(12),并且电触点(16)电连接至例如图3所示的读取晶体管(TL)的栅极。电压跟随器晶体管。部件(PD2)具有被电连接到衬底的电势的P型区域(18)覆盖的N型区域(14)。

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