首页> 外国专利> Process for the selective production of carbon nanotubes and hidrofu00eclicos semiconductor with a high density of structural defects, carbon nanotubes and hidrofu00eclicos semiconductor and process for making semiconductor and / or hidrofu00eclica the superfu00eccie carbon, carbonaceous materials and any A substrate.

Process for the selective production of carbon nanotubes and hidrofu00eclicos semiconductor with a high density of structural defects, carbon nanotubes and hidrofu00eclicos semiconductor and process for making semiconductor and / or hidrofu00eclica the superfu00eccie carbon, carbonaceous materials and any A substrate.

机译:有选择地生产具有高密度结构缺陷的碳纳米管和hidrofeclicos半导体的方法,碳纳米管和hidrofeclicos半导体,以及制造半导体和hidrofeclica的超表面碳,含碳材料以及任何其他材料的方法基板。

摘要

Process for the selective obtained carbon nanotube and hidrofu00eclicos semiconductor with a high density of structural defects, carbon nanotubes and hidrofu00eclicos semiconductor and process for making semiconductor and / or hidrofu00eclica the superfu00eccie of carbons.Materials carbonaceos and any substrate, the present invention relates to a process for obtaining selective and direct carbon nanotube semiconductor and hidrofilicos in powder form or on substrates without the need for additional steps to funcionalizau00e7u00e3o, which have On its surface with a high density of structural defects and nitrogen, oxygen,Hydrogen in its composition.More specifically, the present invention relates to a process for the manufacture of selective carbon nanotube semiconductor and hidrofilicos which comprises the submission of a substrate, previously impregnated with a catalyst, the chemical vapor deposition (CVD) with an atmosphere D. And methanol and gaseous nitrogen at a temperature of degradation of methanol, ie above 6500c.In addition, the present invention relates to a process for making the surface carbon and carbonaceous materials and a number of other semiconductor substrates and / or hidrofilicos using carbon nanotubes which are not subjected to chemical processes funcionaliz action.
机译:选择性获得的具有高密度结构缺陷的碳纳米管和hidrofuclicos半导体的方法,碳纳米管和hidrofuclicos半导体,以及使半导体和hidroficlica成为碳的表面的方法。基材,本发明涉及一种用于获得粉末状或在基材上的选择性和直接碳纳米管半导体和多晶纤维的方法,不需要额外的步骤来对表面具有高密度结构缺陷的功能进行功能化。更具体地,本发明涉及一种用于制造选择性碳纳米管半导体和氢纤丝的方法,该方法包括对预先浸渍有催化剂的基板进行化学气相沉积(CVD)。 )和D气氛,以及温度为o的甲醇和气态氮甲醇的降解,即高于6500c。此外,本发明涉及一种使用未经化学处理的碳纳米管制备表面碳和碳质材料以及许多其他半导体衬底和/或高丝的方法。行动。

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