首页> 外国专利> INLINE VACUUM-DEPOSITION SYSTEM AND A DEPOSITION METHOD USING THE SAME, ENABLING ENVIRONMENT-FRIENDLY PRODUCTION BY THE REPLACING OF COATING WITH VACUUM DEPOSITION

INLINE VACUUM-DEPOSITION SYSTEM AND A DEPOSITION METHOD USING THE SAME, ENABLING ENVIRONMENT-FRIENDLY PRODUCTION BY THE REPLACING OF COATING WITH VACUUM DEPOSITION

机译:在线真空沉积系统和使用该真空沉积系统的沉积方法,通过更换真空沉积涂层使环境友好地生产

摘要

PURPOSE: An inline vacuum-deposition system and a deposition method using the same are provided to save cost and to save a space required for the maintenance of a coating line and a facility and electric energy.;CONSTITUTION: An inline vacuum-deposition system comprises a vacuum conveyor line(100), a dielectric depositing chamber, and a metal depositing chamber(300). A loading chamber(110) and an unloading chamber(120) are formed on both ends of the vacuum conveyor line. The vacuum conveyor line transfers objects from the loading chamber to the unloading chamber. The dielectric deposition chamber is formed on the vacuum conveyor line. The dielectric deposition chamber deposits dielectric to the objects. The dielectric deposition chamber comprises one or more of a basic deposition chamber(210), a middle deposition chamber(220) and a top deposition chamber(230).;COPYRIGHT KIPO 2011
机译:目的:提供一种在线真空沉积系统和使用该系统的沉积方法,以节省成本并节省维护涂覆线和设施以及电能所需的空间。;构成:在线真空沉积系统包括真空输送线(100),电介质沉积室和金属沉积室(300)。在真空输送线的两端形成有装载室(110)和卸载室(120)。真空输送线将物体从装载室转移到卸载室。电介质沉积室形成在真空输送线上。电介质沉积室将电介质沉积到物体上。介电沉积室包括基本沉积室(210),中间沉积室(220)和顶部沉积室(230)中的一个或多个。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110048105A

    专利类型

  • 公开/公告日2011-05-11

    原文格式PDF

  • 申请/专利权人 VACOS CO. LTD.;

    申请/专利号KR20090104774

  • 发明设计人 KIM YOUN TAEG;CHO SANG MOO;YANG SOON SUK;

    申请日2009-11-02

  • 分类号C23C14/56;C23C16/54;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:01

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