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Method, Program Product and Apparatus for Model Based Geometry Decomposition for Use in a Multiple Exposure Process
Method, Program Product and Apparatus for Model Based Geometry Decomposition for Use in a Multiple Exposure Process
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机译:用于多重曝光过程的基于模型的几何分解的方法,程序产品和设备
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摘要
A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: segmenting a plurality of the features into a plurality of polygons; determining the image log slope (ILS) value for each of the plurality of polygons; determining the polygon having the minimum ILS value, and defining a mask containing the polygon; convolving the defined mask with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and, assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned.
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