首页> 外国专利> MOLD FOR THERMAL NANOIMPRINT LITHOGRAPHY, PROCESS FOR FABRICATING THE SAME, AND NANOIMPRINT PROCESS USING THE SAME

MOLD FOR THERMAL NANOIMPRINT LITHOGRAPHY, PROCESS FOR FABRICATING THE SAME, AND NANOIMPRINT PROCESS USING THE SAME

机译:用于热纳米印制术的模具,用于制造相同模型的过程以及使用相同的纳米印过程的模具

摘要

A heating mold for thermal nanoimprint lithography comprising resistive heating means and collecting means for collecting the electromagnetic energy of a variable electromagnetic field emitted by a source located outside the mold, said collecting means being connected to said resistive heating means (34) in which said energy is dissipated.;Method for manufacturing this mold.;A thermal nanoimprint lithography device comprising said mold.;A method for preparing a substrate comprising a surface nanostructured by a thermal nanoimprint lithography technique, wherein said mold is applied.
机译:用于热纳米压印光刻的加热模具,包括电阻加热装置和收集装置,用于收集由位于模具外部的源发出的可变电磁场的电磁能,所述收集装置连接到所述电阻加热装置(34),其中所述能量所述模具的制造方法;包括所述模具的热纳米压印光刻设备;用于制备包括通过热纳米压印光刻技术形成的表面纳米结构的基板的方法,其中,应用所述模具。

著录项

  • 公开/公告号US2012112387A1

    专利类型

  • 公开/公告日2012-05-10

    原文格式PDF

  • 申请/专利权人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请/专利号US201113227388

  • 发明设计人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请日2011-09-07

  • 分类号B29C59/02;B29C35/08;B05D3/10;B05D5/12;

  • 国家 US

  • 入库时间 2022-08-21 17:30:17

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