MASKLESS LITHOGRAPHY APPARATUS FOR DETERMINING THE START POSITION AND POSTURE OF COMPENSATED LITHOGRAPHY AND A METHOD FOR DETERMINING A LITHOGRAPHY START POSITION AND A POSTURE IN MASKLESS LITHOGRAPHY

摘要

PURPOSE: A maskless lithography apparatus a method for determining a lithography start position and a posture in maskless lithography are provided to fine a lithography start position and a posture and determine a comparison difference with a design nominal value by using a relative position difference and a relative posture difference.;CONSTITUTION: A substrate, on which any layer is patterned, is loaded on a transfer table(111). A pattern is exposed to a loaded substrate by using a maskless lithography. A mark position, which is patterned on the substrate and the mark position, which has a newly exposed pattern, are measured. A relative posture difference between a design lithography start posture and an actual posture is obtained by using a measured mark position. The relative position difference between the design lithography start position and an actual position is obtained by using the measured mark position. A compensated lithography start position and posture are determined by using the relative position difference and the relative posture difference.;COPYRIGHT KIPO 2012