Current change which is provided between the plasma chamber and the power supply to limit the current change of the current flowing between the method of limiting the current change of the current flowing between the plasma chamber and the power supply, and the power supply and the plasma chamber limiting device, and vacuum processing apparatus

摘要

PROBLEM TO BE SOLVED: To provide a method and a device capable of controlling electric current flowing between a plasma chamber and a power supply.;SOLUTION: The current change rate limiting device 20 prepared at a current path between the power supply 2 and the plasma chamber 3 for limiting a current change rate di/dt of an electric current Iout flowing between the plasma chamber 3 and the power supply 2 includes a non-linear device and an inductor L, and the L is pre-charged by being supplied with DC current. In addition, a current sensor 28 measures the current between the plasma chamber 3 and the power supply 2.;COPYRIGHT: (C)2009,JPO&INPIT