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The film forming method by laser ablation, laser ablation for the target and method of manufacturing the laser ablation for the target used in the way
The film forming method by laser ablation, laser ablation for the target and method of manufacturing the laser ablation for the target used in the way
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机译:通过激光烧蚀的成膜方法,靶材的激光烧蚀以及以该方式使用的靶材的激光烧蚀的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by laser ablation, in which the thin film can be deposited satisfactorily efficiently while suppressing the intrusion of a droplet satisfactorily.;SOLUTION: The method for depositing the thin film by laser ablation includes the steps of: irradiating a target 1 with laser beams to produce scattering particles (a); and sticking the scattering particles (a) onto the surface of a base material 5 to deposit the thin film on the surface of the base material. The target 1 includes a supporting substrate and a particle layer which is formed on the supporting substrate and composed of particles of an inorganic material. The average particle size of the particles of the inorganic material is 5 nm to 50 μm and the thickness of the particle layer is 1-200 μm.;COPYRIGHT: (C)2011,JPO&INPIT
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