Optical system for use in extreme UV (EUV) applications e.g. EUV lithography, has micro-channel system that comprises micro channel segments having micro-channel for passing cooling medium and is associated with micro-mirrors

摘要

The system (10) has multiple micro-mirrors (14) that comprise mirror housing, a carrier housing and a mirror surface. The mirror surface is tilted with a cooling system for dissipating heat from one of the micro mirrors. The cooling system comprises a micro-channel system for passing a cooling medium. The micro-channel system comprises multiple micro channel segments having a micro-channel for passing the cooling medium and is associated with the micro-mirrors. An independent claim is included for a method of manufacturing an optical system for EUV applications.