首页> 外国专利> Method for detecting scale of diffractive optical structure for interferometric study of lithographic optics, involves detecting direction of radiation reflected on radiation elements, and wavelength of radiation on optical arrangement

Method for detecting scale of diffractive optical structure for interferometric study of lithographic optics, involves detecting direction of radiation reflected on radiation elements, and wavelength of radiation on optical arrangement

机译:用于光刻光学干涉研究的衍射光学结构的尺度检测方法,包括检测在辐射元件上反射的辐射方向以及在光学装置上的辐射波长

摘要

The method involves irradiating an optical arrangement with the radiation (170). A retroreflector (160) is arranged at the downstream of diffractive optical structure (150). The diffractive optical structure has several diffraction regions (151-155) reflected in different ways to the optical arrangement radiation elements (171-175). The direction of radiation reflected on optical arrangement radiation elements, and radiation wavelength are detected. The scale of diffractive optical structure is determined based on the detected radiation directions and wavelength of radiation. Independent claims are included for the following: (1) apparatus for detecting scale of diffractive optical structure; (2) method for determining change in length of element having diffractive optical structure; and (3) method for determining temperature of element having diffractive optical structure.
机译:该方法包括用辐射(170)照射光学装置。后向反射器(160)布置在衍射光学结构(150)的下游。衍射光学结构具有几个以不同方式反射到光学装置辐射元件(171-175)的衍射区域(151-155)。检测在光学装置辐射元件上反射的辐射方向以及辐射波长。基于检测到的辐射方向和辐射波长来确定衍射光学结构的尺度。包括以下方面的独立权利要求:(1)用于检测衍射光学结构的尺度的设备; (2)确定具有衍射光学结构的元件的长度变化的方法; (3)确定具有衍射光学结构的元件的温度的方法。

著录项

  • 公开/公告号DE102014207883A1

    专利类型

  • 公开/公告日2014-07-24

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE201410207883

  • 发明设计人 DÖRBAND BERND;HETZLER JOCHEN;

    申请日2014-04-25

  • 分类号G01B9/02;G03F7/20;G02B27;

  • 国家 DE

  • 入库时间 2022-08-21 15:37:05

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