Plasma-facing probe device provided with a vacuum gap for use in the plasma processing chamber

摘要

[Challenge] Devices for measuring process parameters [SOLUTION] plasma processing chamber is provided. The apparatus comprises a probe structure disposed in the opening of the upper electrode. Probe structure is provided with a probe head, the head portion and the probe head is provided with a flange. The apparatus further comprises disposed between the flange portion and the upper electrode O- ring. Furthermore, since the probe structure to avoid touching the top electrode, the apparatus comprises a spacer formed of an electrically insulating material is disposed between the opening of the upper electrode head. The spacer comprises a disk portion configured to support the underside of the flange portion. In addition, the spacer includes a hollow cylindrical portion that is configured to enclose the head. By forming a right angle between the path and the opening of the processing chamber and O- rings, spacer prevents direct sight path between the opening to the processing chamber and O- ring. [Selection Figure Figure 2