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Method of manufacturing an edge emphasis type phase shift mask and the edge enhancement phase shift mask
Method of manufacturing an edge emphasis type phase shift mask and the edge enhancement phase shift mask
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机译:边缘增强型相移掩模的制造方法和边缘增强相移掩模
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摘要
PROBLEM TO BE SOLVED: To provide a production method of an edge-enhanced phase shift mask, by which dimensional accuracy of a pattern in a phase shift film can be made uniform.;SOLUTION: The production method of an edge-enhanced phase shift mask includes the steps of: forming a conductive light-shielding film 10 on a transparent substrate 100; applying a positive resist 300 on the light-shielding film; drawing a pattern in the positive resist; developing the positive resist to form a resist pattern; removing an exposed part of the light-shielding film by etching to form a light-shielding pattern where the positive resist remains; immersing the transparent substrate having the light-shielding pattern thus formed together with a metal substance for forming a phase shift film, in an electrolytic cell reserving an electrolytic liquid, and applying a voltage between the light-shielding film and the metal substance to deposit a phase shift film on a pattern end face of the light-shielding pattern by electrolytic plating.;COPYRIGHT: (C)2014,JPO&INPIT
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