MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING MONOMER, AND METHOD FOR FORMING PATTERN USING HARDMASK COMPOSITION

摘要

The present invention relates to a monomer for a hardmask composition, a hardmask composition comprising the monomer, and to a method for forming a pattern using the same. In chemical formula 1, the definitions of A, A′, L, X, X′, X″, k, m and n are the same as defined in the specification.;COPYRIGHT KIPO 2016