OPTICAL SYSTEM HAVING HIGHER RESISTANCE TO EXTERNAL INFLUENCE AFFECTING OPTICAL PROPERTIES

摘要

FIELD: information technology.;SUBSTANCE: system for projecting one or more synthetic optical images includes one or several structures of images pictograms; and one or more completely included structures of images pictograms focusing elements. Herewith one or several structures of images pictogram focusing elements are arranged relative to one or several structures of images pictograms in such a way, that at least part of images pictogram focusing elements forms at least one synthetic image of at least part of images pictograms. Focal distance(s) of the focusing elements in the system is(are) inevitable due to complete including – encapsulation – of a section surfaces ensuring the focusing into the system. Herewith the images pictograms are coated and/or filled with voids or cavities formed on the lining or inside it.;EFFECT: technical result is elimination of defocusing of the focusing elements, which project the protective synthetic image caused by a contact of any other transparent materials or layers with the said elements.;63 cl, 3 dwg